Submitted by sws139
on
Low Temperature Method for CVD
A method for conformally coating substrates with semiconductors at lower temperatures than is possible with conventional chemical vapor deposition (CVD). The deposited semiconductor can infiltrate very small voids and spaces so that it is possible to deposit onto very large areas within static, rolled-up substrates. -John Badding
We work together with the Office of Technology Management (OTM) and the Office for Industrial Partnerships (OIP), engaging in assisting inventors in capturing Intellectual Property (IP), and providing academic resources and support to entrepreneurs.